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Mrs Sanna Makela
Teams and roles for Sanna Makela
Process Engineer
Publication
2026
- Peach, T. et al. 2026. Hybrid HSQ resist-mask lithography for ultra-low line edge roughness 150 mm InP wafer scale up. IEEE Transactions on Semiconductor Manufacturing (10.1109/tsm.2026.3727003)
Articles
- Peach, T. et al. 2026. Hybrid HSQ resist-mask lithography for ultra-low line edge roughness 150 mm InP wafer scale up. IEEE Transactions on Semiconductor Manufacturing (10.1109/tsm.2026.3727003)